COMPOSITION FOR POSITIVE TYPE PHOTOSENSITIVE ANIONIC ELECTRODEPOSITION COATING MATERIAL

PROBLEM TO BE SOLVED: To provide a composition for a positive type photosensitive anionic electrodeposition coating material, which is good in stability with the lapse of time in a liquid state and exhibits good circuit formation performances such as developability or etching resistance. SOLUTION: The composition for the positive type photosensitive anionic electrodeposition coating material contains: (A) 60-95 pts.wt. of a water-soluble or water-dispersible vinyl-based copolymer having a carboxy group at the terminal of the main chain, which is obtained by copolymerizing following (a) to (c) components: (a) 2-15 pts.wt. of a copolymerizable vinyl-based monomer having a carboxy group as a substituent, (b) 85-98 pts.wt of a copolymerizable vinyl-based monomer except the monomer (a), and (c) 0.05-10 pts.wt of a chain transfer agent having a carboxy group, whose amount is based on the 100 pts.wt. of the total of the copolymerizable vinyl-based monomers (a) and (b); (B) 5-40 pts.wt. of a low molecular photosensitive agent having on average from one to two photosensitive groups per one molecule; and (C) a tertiary amine as a neutralizing agent in an amount of 0.2-0.9 mol based on 1 mol of the carboxy group of the (A) component. COPYRIGHT: (C)2010,JPO&INPIT