COMPOSITION OF ETCHING LIQUID FOR CONDUCTOR FILM

PROBLEM TO BE SOLVED: To provide a composition of etching liquid for conductor film assuring higher stability in processes and excellent economic processes for enabling effective etching of a conductor film without generation of residues after the etching process, suppressing generation of bubbles d...

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Bibliographische Detailangaben
Hauptverfasser: TANIGUCHI WAKAKO, AOYAMA TETSUO, KAWASHIMA TAKESHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a composition of etching liquid for conductor film assuring higher stability in processes and excellent economic processes for enabling effective etching of a conductor film without generation of residues after the etching process, suppressing generation of bubbles during the etching processes, and ensuring excellent solubility of indium oxalic acid. SOLUTION: An aqueous solution containing oxalic acid, hydrochloric, and interfacial active agent is used as an etching liquid (composition of etching liquid for conductor film). As the interfacial active agent, at least a kind of an anionic interfacial active agent, non-ionic interfacial active agent, fluorine system interfacial active agent is used. A transparent conductor film mainly formed of indium tin oxide or indium zinc oxide is etched with the composition of etching liquid for conductor film. COPYRIGHT: (C)2010,JPO&INPIT