ALKALINE DEVELOPABLE PHOTOSENSITIVE MATERIAL

PROBLEM TO BE SOLVED: To provide a super-hydrophobic photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. SOLUTION: The photosensitive resin composition comprises: (A) 100 pts.wt. of a first polymer...

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Bibliographische Detailangaben
Hauptverfasser:	PARK CHUN GEUN, LEE MOO YOUNG, HAN SEOK, KIM SEUNG KEUN, LEE HAG JU, SUNG IN KYUNG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a super-hydrophobic photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. SOLUTION: The photosensitive resin composition comprises: (A) 100 pts.wt. of a first polymer containing a (meth)acrylate unit end-capped with a 3-acryloyloxy-2-hydroxypropyl group or a (meth)acryl group in a side chain and a unit having a fluoro-substituted 4-30C alkyl, alkenyl, aryl, aralkyl or alkylaryl group as polymerized units; (B) 50-120 pts.wt. of a polyfunctional (meth)acrylate monomer; and (C) 1-20 pts.wt. of a photoinitiator. COPYRIGHT: (C)2010,JPO&INPIT