PHOTOSENSITIVE PASTE COMPOSITION AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is inexpensive, has high adhesion strength to a glass substrate in the form of a thin film, and can form a high-definition pattern with a low resistance value. SOLUTION: The photosensitive paste composition includes aluminum p...

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Bibliographische Detailangaben
Hauptverfasser:	OKABE SHOGO, HIRANO TOSHISANE, KUDO KAZUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is inexpensive, has high adhesion strength to a glass substrate in the form of a thin film, and can form a high-definition pattern with a low resistance value. SOLUTION: The photosensitive paste composition includes aluminum powder (A), glass powder (B), an alkali-soluble resin (C), a polyfunctional (meth)acrylate (D) and a photopolymerization initiator (E), wherein a rate of weight change of the aluminum powder (A) in a range of 25-600°C measured by thermogravimetric analysis (based on weight at 25°C) is ≤+7.0%. COPYRIGHT: (C)2010,JPO&INPIT