SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To promote the improvement of the quality of an SOD film in a high temperature oxidation atmosphere, and also to prevent the damage of elements under a liner film or a semiconductor substrate. SOLUTION: The semiconductor device includes a recess and a first liner film 4 and a s...

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Bibliographische Detailangaben
Hauptverfasser: SHIMAMOTO KAZUMA, SUMIYA TOMOHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To promote the improvement of the quality of an SOD film in a high temperature oxidation atmosphere, and also to prevent the damage of elements under a liner film or a semiconductor substrate. SOLUTION: The semiconductor device includes a recess and a first liner film 4 and a second liner film 5 containing oxygen atoms, which are sequentially formed on the inner wall side face of the recess, and an insulation region filled in the recess. The oxygen resistance of the first liner film is superior to that of the second liner film. COPYRIGHT: (C)2010,JPO&INPIT