FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a film deposition method which can produce an oil-repellent base material having an excellent oil-repellent film provided with wear resistance to withstand practical use. SOLUTION: The film deposition method comprises: a first irradiation stage where the surface of a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SUGAWARA TAKUYA, SHIONO ICHIRO, NAGAE EKISHU, KYO YUSHO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film deposition method which can produce an oil-repellent base material having an excellent oil-repellent film provided with wear resistance to withstand practical use. SOLUTION: The film deposition method comprises: a first irradiation stage where the surface of a substrate 101 is irradiated with grains having energy; a first film deposition stage where a first film 103 is deposited on the surface of the substrate 101 after the first irradiation stage using a dry process; and a second film deposition stage where a second film 105 having oil repellency is deposited on the surface of the first film 103. COPYRIGHT: (C)2010,JPO&INPIT