METHOD FOR MEASURING PATTERN USING SCANNING ELECTRON MICROSCOPE

PROBLEM TO BE SOLVED: To provide a method of removing blur of a pattern image acquired by an SEM and easily and accurately measuring the three-dimensional shape of a pattern of a sample surface based on information of the height direction of a pattern acquired by another measuring machine such as an...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOSHIDA KOJI, MORIKAWA YASUTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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