PREBAKE METHOD AND PREBAKE APPARATUS

PROBLEM TO BE SOLVED: To provide a prebake method that can achieve in-plane uniformity of a thickness of a resin film and can shorten an exhaustion time period after a substrate is carried when a workpiece is subjected to prebaking, wherein the workpiece has the resin film formed by applying an appl...

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Bibliographische Detailangaben
Hauptverfasser: KOBASHI YASUHIRO, AWAKAWA HIDEO, KAI TOMOHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a prebake method that can achieve in-plane uniformity of a thickness of a resin film and can shorten an exhaustion time period after a substrate is carried when a workpiece is subjected to prebaking, wherein the workpiece has the resin film formed by applying an application liquid containing a solvent to a glass substrate such as a coloring pixel for a color filter; and to provide an apparatus for using the same. SOLUTION: In the prebake method, the workpiece is subjected to prebake, wherein the workpiece has the resin film formed by applying an application liquid containing a solvent to a glass substrate. The prebake method sequentially includes: a step of carrying the workpiece to a substrate housing space on a hot plate provided in a prebake apparatus; a step of heating the workpiece for a predetermined time period, while placing the workpiece on lift pins of the hot plate, without performing compulsory exhaustion; a step of heating the workpiece for a predetermined time period while placing the workpiece on the hot plate by lowering the lift pins and performing the compulsory exhaustion from the substrate housing space of the hot plate; a step of carrying the workpiece out of the substrate housing space; and a step of further performing the compulsory exhaustion from the substrate housing space of the hot plate. COPYRIGHT: (C)2010,JPO&INPIT