LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system or the like. SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and a means for stabilizing a temperature of the s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OTTENS JOOST JEROEN, ZAAL KOEN JACOBUS J M
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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