LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system or the like. SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and a means for stabilizing a temperature of the s...

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Bibliographische Detailangaben
Hauptverfasser:	OTTENS JOOST JEROEN, ZAAL KOEN JACOBUS J M
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system and the like for improving accuracy for positioning a substrate with respect to a projection system or the like. SOLUTION: A lithographic apparatus with a cover plate formed separately from a substrate table and a means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with a thermal insulation material provided between a cover plate and a substrate table so that the cover plate acts as a thermal shielding material for the substrate table is disclosed. A lithographic apparatus comprising a means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. COPYRIGHT: (C)2010,JPO&INPIT