EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To automatically set a suitable unit parameter inherent parameter in each unit by suitably performing the version matching of software and the management of unit configurations in an exposure apparatus composed of a plurality of units, and a management system for the exposure a...

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Bibliographische Detailangaben
Hauptverfasser:	ONUMA TETSUSHI, NAKAJIMA DAISUKE, YAGI NORIYUKI, NETANI NAOTOSHI, EKOSHI YUKIHISA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY MAGNETOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To automatically set a suitable unit parameter inherent parameter in each unit by suitably performing the version matching of software and the management of unit configurations in an exposure apparatus composed of a plurality of units, and a management system for the exposure apparatus. SOLUTION: Unit information is stored in a storage medium attached to the unit and the information is obtained by wired or wireless communication. COPYRIGHT: (C)2010,JPO&INPIT