INSPECTION METHOD FOR MEMBRANE SHAPE OF STENCIL MASK AND INSPECTION APPARATUS FOR MEMBRANE SHAPE OF STENCIL MASK

PROBLEM TO BE SOLVED: To provide an inspection method for the membrane shape of a stencil mask and an inspection apparatus for the membrane shape of a stencil mask, in which qualities and reliability of a stencil mask can be improved and the yield can be improved as inspection of the membrane shape...

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Bibliographische Detailangaben
1. Verfasser:	ITO KOJIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an inspection method for the membrane shape of a stencil mask and an inspection apparatus for the membrane shape of a stencil mask, in which qualities and reliability of a stencil mask can be improved and the yield can be improved as inspection of the membrane shape of the stencil mask is systematically and automatically carried out. SOLUTION: The inspection method for the membrane shape of a stencil mask to be used for manufacturing semiconductors is characterized in that a stencil mask is placed on an XY stage and a sheet beam by a laser is made to be obliquely incident to the surface of the stencil mask so as to obtain an optical cutting image by reflection from the stencil mask. COPYRIGHT: (C)2010,JPO&INPIT