METHOD FOR DEPOSITING THIN FILM AND APPARATUS FOR DEPOSITING THIN FILM

PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by which the film deposition efficiency can be improved. SOLUTION: The method for depositing the thin film comprises depositing a first thin film having a smaller film thickness than a target film thickness on a substrate S held an...

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Bibliographische Detailangaben
Hauptverfasser:	SHIONO ICHIRO, KYO YUSHO, SATO TOSHIHIKO, SAI KYOKUYO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for depositing a thin film by which the film deposition efficiency can be improved. SOLUTION: The method for depositing the thin film comprises depositing a first thin film having a smaller film thickness than a target film thickness on a substrate S held and rotated by a rotary drum 13 by sputtering targets 29a and 29b, followed by depositing a second thin film having a film thickness to fill up the shortage of the film thickness with respect to the target film thickness on the first thin film. The method includes: an optical measurement step of measuring a film thickness of the first film; a film deposition rate calculation step of calculating an actual film deposition rate in the deposition of the first thin film based on the measured film thickness; and a film deposition time adjustment step of adjusting a film deposition time by calculating the rest of film deposition time necessary to deposit the second thin film based on the actual film deposition rate. COPYRIGHT: (C)2010,JPO&INPIT