EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure apparatus which can realize both reduction of influence of foreign substance due to gap expansion and lowering of original circuit imaging precision. SOLUTION: The level of a proximity gap formed between a photo mask 3A on a mask receiver 4 and a glass su...

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Bibliographische Detailangaben
1. Verfasser:	KOMATSU HISATAKA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an exposure apparatus which can realize both reduction of influence of foreign substance due to gap expansion and lowering of original circuit imaging precision. SOLUTION: The level of a proximity gap formed between a photo mask 3A on a mask receiver 4 and a glass substrate 1C on a substrate stage 2 is changed at a center part which is a barycentric position of the photo mask 3A and at a peripheral part near a fixed end of the photo mask 3A. COPYRIGHT: (C)2010,JPO&INPIT