PARTICLE DETECTION ON OBJECT SURFACE
PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | VLADIMIRSKY YULI WALSH JAMES H |
| description | PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface, and a sensor for receiving the projected real image. A computer system can be coupled to the sensor for storing and analyzing the real image. The method includes illuminating the object surface with an illumination beam, intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface onto the sensor. The real image is processed to detect particles located on the object surface. Thus, a system and a method for in-situ detection of contaminants or defects on a reticle are provided. COPYRIGHT: (C)2010,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2010049250A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2010049250A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2010049250A3</originalsourceid><addsrcrecordid>eNrjZFAJcAwK8XT2cVVwcQ1xdQ7x9PdTACEnLyBHITg0yM3R2ZWHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBoYmFgamRo4GhOlCACzVSM9</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PARTICLE DETECTION ON OBJECT SURFACE</title><source>esp@cenet</source><creator>VLADIMIRSKY YULI ; WALSH JAMES H</creator><creatorcontrib>VLADIMIRSKY YULI ; WALSH JAMES H</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface, and a sensor for receiving the projected real image. A computer system can be coupled to the sensor for storing and analyzing the real image. The method includes illuminating the object surface with an illumination beam, intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface onto the sensor. The real image is processed to detect particles located on the object surface. Thus, a system and a method for in-situ detection of contaminants or defects on a reticle are provided. COPYRIGHT: (C)2010,JPO&INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100304&DB=EPODOC&CC=JP&NR=2010049250A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100304&DB=EPODOC&CC=JP&NR=2010049250A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VLADIMIRSKY YULI</creatorcontrib><creatorcontrib>WALSH JAMES H</creatorcontrib><title>PARTICLE DETECTION ON OBJECT SURFACE</title><description>PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface, and a sensor for receiving the projected real image. A computer system can be coupled to the sensor for storing and analyzing the real image. The method includes illuminating the object surface with an illumination beam, intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface onto the sensor. The real image is processed to detect particles located on the object surface. Thus, a system and a method for in-situ detection of contaminants or defects on a reticle are provided. COPYRIGHT: (C)2010,JPO&INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAJcAwK8XT2cVVwcQ1xdQ7x9PdTACEnLyBHITg0yM3R2ZWHgTUtMac4lRdKczMoubmGOHvophbkx6cWFyQmp-allsR7BRgZGBoYmFgamRo4GhOlCACzVSM9</recordid><startdate>20100304</startdate><enddate>20100304</enddate><creator>VLADIMIRSKY YULI</creator><creator>WALSH JAMES H</creator><scope>EVB</scope></search><sort><creationdate>20100304</creationdate><title>PARTICLE DETECTION ON OBJECT SURFACE</title><author>VLADIMIRSKY YULI ; WALSH JAMES H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2010049250A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>VLADIMIRSKY YULI</creatorcontrib><creatorcontrib>WALSH JAMES H</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VLADIMIRSKY YULI</au><au>WALSH JAMES H</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PARTICLE DETECTION ON OBJECT SURFACE</title><date>2010-03-04</date><risdate>2010</risdate><abstract>PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface, and a sensor for receiving the projected real image. A computer system can be coupled to the sensor for storing and analyzing the real image. The method includes illuminating the object surface with an illumination beam, intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface onto the sensor. The real image is processed to detect particles located on the object surface. Thus, a system and a method for in-situ detection of contaminants or defects on a reticle are provided. COPYRIGHT: (C)2010,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2010049250A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PARTICLE DETECTION ON OBJECT SURFACE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T10%3A58%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VLADIMIRSKY%20YULI&rft.date=2010-03-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2010049250A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |