PARTICLE DETECTION ON OBJECT SURFACE

PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from...

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Bibliographische Detailangaben
Hauptverfasser:	VLADIMIRSKY YULI, WALSH JAMES H
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system and a method for particle detection using real imaging. SOLUTION: Systems and methods are provided for inspecting an object surface. The system includes an illumination source for illuminating an object surface, an optic for intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface, and a sensor for receiving the projected real image. A computer system can be coupled to the sensor for storing and analyzing the real image. The method includes illuminating the object surface with an illumination beam, intercepting scattered light from the illuminated object surface and projecting a real image of a desired area of the object surface onto the sensor. The real image is processed to detect particles located on the object surface. Thus, a system and a method for in-situ detection of contaminants or defects on a reticle are provided. COPYRIGHT: (C)2010,JPO&INPIT