VACUUM CHAMBER

PROBLEM TO BE SOLVED: To provide a vacuum chamber having a differential gas discharge seal such that a substrate is carried in and out in a state where desired vacuum pressure is maintained in a process room. SOLUTION: The vacuum chamber 10 includes a floating chuck 40 as a substrate conveying mecha...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NAKAMURA TAKESHI, MATSUZAKA MASAAKI
Format: Patent
Sprache:eng
Schlagworte:
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