VACUUM CHAMBER

PROBLEM TO BE SOLVED: To provide a vacuum chamber having a differential gas discharge seal such that a substrate is carried in and out in a state where desired vacuum pressure is maintained in a process room. SOLUTION: The vacuum chamber 10 includes a floating chuck 40 as a substrate conveying mecha...

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Hauptverfasser:	NAKAMURA TAKESHI, MATSUZAKA MASAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CONVEYING CYLINDERS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HANDLING THIN OR FILAMENTARY MATERIAL HEATING LIGHTING MECHANICAL ENGINEERING PACKING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PISTONS PNEUMATIC TUBE CONVEYORS SEALINGS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING THEIR RELEVANT APPARATUS THERMAL INSULATION IN GENERAL TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a vacuum chamber having a differential gas discharge seal such that a substrate is carried in and out in a state where desired vacuum pressure is maintained in a process room. SOLUTION: The vacuum chamber 10 includes a floating chuck 40 as a substrate conveying mechanism capable of conveying the substrate W in a prescribed direction so that the substrate W may pass through the process room P, and the differential gas discharge seal 20 disposed at a periphery of the process room P and sealing a gap between the conveyed substrate W and a seal surface 21 opposed to the substrate W, wherein the floating chuck 40 also functions as a distortion removing means of removing distortion of the conveyed substrate W. COPYRIGHT: (C)2010,JPO&INPIT