TRANSPARENT CONDUCTIVE SUBSTRATE, AND MANUFACTURING METHOD THEREOF

PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive substrate forming a titanium oxide-based transparent conductive film exhibiting excellent conductivity by a simple coating method. SOLUTION: The transparent conductive substrate with a specific resistance of not more...

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Hauptverfasser: NAKADA KUNIHIKO, SUGAWARA KENICHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive substrate forming a titanium oxide-based transparent conductive film exhibiting excellent conductivity by a simple coating method. SOLUTION: The transparent conductive substrate with a specific resistance of not more than 9×10-3Ωcm is obtained by: forming a base layer consisting of a titanium oxide-based thin film of an anatase crystal phase on a transparent base material; coating precursor liquid (I) containing a reaction product (A) made by reaction of a titanium compound and hydrogen peroxide and a reaction product (B) made by reaction of a niobium compound or a tantalum compound and hydrogen peroxide onto the base layer; firing the coating; and heating the fired coating under a reducing atmosphere to perform annealing treatment to form a transparent conductive film made of niobium- or tantalum-doped titanium oxide on the base layer. COPYRIGHT: (C)2010,JPO&INPIT