PLANTING PENETRATION TRENCH

PROBLEM TO BE SOLVED: To provide a planting penetration trench capable of suppressing the degradation of the storage function of the trench resulting from the deposition of mud and sediment by accumulating the mud and sediment flowing into the trench at the bottom of the trench and discharging the m...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSUTSUMI SHOICHI, JO EIKYO
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a planting penetration trench capable of suppressing the degradation of the storage function of the trench resulting from the deposition of mud and sediment by accumulating the mud and sediment flowing into the trench at the bottom of the trench and discharging the mud and sediment out of the trench. SOLUTION: A space 19 for accumulating the mud and sediment flowing into the trench is formed at the bottom of the trench using a resin pallet 15 which is an example of a spacer. The bottom surface of the space 19 has a gradient tilted downward toward an inlet 20 for mud and segment. The mud and sediment accumulated in the space 19 flow down naturally to the inlet 20 by the gradient. COPYRIGHT: (C)2010,JPO&INPIT