METHOD FOR MANUFACTURING FINE UNEVEN STRUCTURE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine uneven structure using a nanoimprint capable of faithfully forming an inversion formation of a mold on a resin without being affected by the kind of resin to be used and/or its molecular weight. SOLUTION: The manufacturing method inc...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KUMAGAI AKIYASU
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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