METHOD FOR MANUFACTURING FINE UNEVEN STRUCTURE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine uneven structure using a nanoimprint capable of faithfully forming an inversion formation of a mold on a resin without being affected by the kind of resin to be used and/or its molecular weight. SOLUTION: The manufacturing method inc...

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1. Verfasser:	KUMAGAI AKIYASU
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine uneven structure using a nanoimprint capable of faithfully forming an inversion formation of a mold on a resin without being affected by the kind of resin to be used and/or its molecular weight. SOLUTION: The manufacturing method includes the step for placing a resin 14 on a substrate 12, and the step for pressing a mold 16 having nano-level fine unevenness. When a radius of gyration in a Θ state of the resin is assumed to be Rg and the minimum size of a mold recessed part having the resin inserted is assumed to be L, the value of L/Rg is made to be 3 or more. COPYRIGHT: (C)2010,JPO&INPIT