FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS, AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a fluid-handling structure for a lithographic apparatus. SOLUTION: The fluid-handling structure has a plurality of openings, arranged in the form of a straight line, in a plan view. The fluid-handling structure is configured so that the opening is oriented toward an...

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Hauptverfasser:	DANNY MARIA HUBERTUS PHILIPS, FABRIZIO EVANGELISTA, LAMBERTUS DONDERS SJOERD NICOLAAS, RIEPEN MICHEL, BAETEN ADRIANES JOHANNES, CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN, DIREKS DANIEL JOSEPH MARIA, KEMPER NICOLAAS R
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a fluid-handling structure for a lithographic apparatus. SOLUTION: The fluid-handling structure has a plurality of openings, arranged in the form of a straight line, in a plan view. The fluid-handling structure is configured so that the opening is oriented toward an opposed surface, when it is in use; and here, the opposed surface is a substrate and/or a substrate table. The substrate table is configured so as to support the substrate. There is a damper outside the line of the opening. The damper can have a width that changes along the line of the opening. The damper width is defined between the line of the opening and a damper edge part which in opposition thereto. COPYRIGHT: (C)2010,JPO&INPIT