RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a resist composition capable of maintaining a film retention rate of a resist film after development to an appropriate range. SOLUTION: The resist composition contains: a resin (A) which becomes alkali-soluble by the action of an acid and which includes a structural...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAGAWA TAKAYUKI, KAMABUCHI AKIRA, SHIGEMATSU JUNJI, EDAMATSU KUNISHIGE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resist composition capable of maintaining a film retention rate of a resist film after development to an appropriate range. SOLUTION: The resist composition contains: a resin (A) which becomes alkali-soluble by the action of an acid and which includes a structural unit having an acid-labile group in a side chain and a structural unit represented by formula (I) (where in formula (I), R1represents a hydrogen atom or a methyl group, ring X represents an unsubstituted or substituted cyclic hydrocarbon group having 3 to 30 carbon atoms and including an ester bond in the cyclic structure, and k represents an integer of 1 to 4); a resin (B) including a di-2-hydroxy-hexafluoroisopropyl-cyclohexyl group in a side chain; and an acid generator. COPYRIGHT: (C)2010,JPO&INPIT