Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL FOR FORMING SOFT MAGNETIC FILM

PROBLEM TO BE SOLVED: To provide an Fe-Co-based alloy sputtering target material for forming a soft magnetic film used for a vertical magnetic recording medium or the like, which easily achieves amorphousness and the improvement of corrosion resistance, and also has excellent magnetic properties. SO...

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Hauptverfasser:	FUJIMOTO MITSUHARU, FUKUOKA ATSUSHI, UENO TOMONORI
Format:	Patent
Sprache:	eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an Fe-Co-based alloy sputtering target material for forming a soft magnetic film used for a vertical magnetic recording medium or the like, which easily achieves amorphousness and the improvement of corrosion resistance, and also has excellent magnetic properties. SOLUTION: Regarding the Fe-Co-based alloy sputtering target material for forming a soft magnetic film, in a sputtering target material obtained by incorporating 10 to 30 atomic% Ta or Nb into an Fe-Co alloy whose compositional formula in atomic ratio is expressed by (FeX-Co100-X), 30≤X≤80, the intensity ratio [I(TaNb-BCC)/I(FeCo-BCC)] between the X-ray diffraction intensity of the (110) plane in a BCC phase essentially consisting of Fe and Co, [I(FeCo-BCC)] and the X-ray diffraction intensity of the (110) plane in a BCC phase essentially consisting of Ta or Nb, [I(TaNb-BCC)] is ≤0.15. COPYRIGHT: (C)2010,JPO&INPIT