COAXIAL TYPE VACUUM ARC DEPOSITION SOURCE AND VACUUM DEPOSITION SYSTEM

PROBLEM TO BE SOLVED: To provide a coaxial type vacuum arc deposition source which can easily form an alloy film, and to provide a vacuum deposition system provided therewith. SOLUTION: The coaxial type vacuum arc deposition source 8 comprises: a cylindrical insulator 14; a vapor deposition material...

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Hauptverfasser: AGAWA YOSHIAKI, MATSUURA MASAMICHI, TANEMURA MASAYUKI, YAMAGUCHI KOICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a coaxial type vacuum arc deposition source which can easily form an alloy film, and to provide a vacuum deposition system provided therewith. SOLUTION: The coaxial type vacuum arc deposition source 8 comprises: a cylindrical insulator 14; a vapor deposition material 80 arranged at the inner circumferential part of the insulator 14, and around which two or more metal foils 82 (82a, 82b) are wound in piles; a trigger electrode 13 arranged at the outer circumferential part of the insulator 14; and a cylindrical anode 23 arranged around the trigger electrode 13. In this way, production of alloy ingots of two or more metals is made needless. Further, formation of an alloy film of a material which is hardly alloyed is made possible. Further, by using three or more metal foils, an alloy film of ternary or more components can be easily formed. COPYRIGHT: (C)2010,JPO&INPIT