AQUEOUS DISPERSION FOR POLISHING AND POLISHING METHOD

PROBLEM TO BE SOLVED: To provide an aqueous dispersion for polishing a color filter, polishing uneven part generated on a color filter in a color filter manufacturing process while attaining high polishing speed and high flattening characteristic, and to provide a color filter polishing method using...

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Bibliographische Detailangaben
1. Verfasser:	UENO TOMIKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS FREQUENCY-CHANGING GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS POLISHING SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an aqueous dispersion for polishing a color filter, polishing uneven part generated on a color filter in a color filter manufacturing process while attaining high polishing speed and high flattening characteristic, and to provide a color filter polishing method using the aqueous dispersion for polishing a color filter. SOLUTION: This aqueous dispersion for polishing a color filter includes: (A) inorganic particles having a mean primary particle diameter of 10-100 nm and a means secondary particle diameter of 30-300 nm, and (B) water soluble polymer having a molecular weight of 5,000-5,000,000. Further it may include (C) organic particles. COPYRIGHT: (C)2010,JPO&INPIT