PLASMA CVD APPARATUS, DLC FILM, AND METHOD FOR PRODUCING THIN FILM

PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which can increase a voltage VDCthat is a DC component generated in an electrode while a high-frequency power discharges electricity when forming a film with a CVD technique. SOLUTION: The plasma CVD apparatus includes: a chamber 1; a holding e...

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Hauptverfasser:	KAWABE TAKEHARU, HONDA YUJI, ABE KOJI, HAYAKAWA HARUHITO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which can increase a voltage VDCthat is a DC component generated in an electrode while a high-frequency power discharges electricity when forming a film with a CVD technique. SOLUTION: The plasma CVD apparatus includes: a chamber 1; a holding electrode 2 which is arranged in the chamber and holds a substrate to be film-formed; a high-frequency power source 8 which is electrically connected to the holding electrode 2; a counter electrode 12 which is arranged so as to oppose to the substrate to be film-formed held by the holding electrode 2 and is connected to a ground power source or a floating power source; a source-gas-feeding mechanism which feeds a source gas to a space 13 between the counter electrode 12 and the holding electrode 2; and an exhausting mechanism which evacuates the inside of the chamber. The surface areas of the holding electrode 2 and the counter electrode 12 satisfy the expression of b/a≥2 when the surface areas are defined as a and b, respectively. COPYRIGHT: (C)2010,JPO&INPIT