VACUUM PROCESSING APPARATUS

VACUUM PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To reduce the amount of mixture of moisture and particles in a processing container when a lid body for clogging the upper opening of a container body is opened and an object to be processed is brought into or taken out of the processing container. SOLUTION: The processing cont...

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Hauptverfasser: TANAKA ZENSHI, ISHIDA HIROSHI, SASAKI YOSHIHIKO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator TANAKA ZENSHI
ISHIDA HIROSHI
SASAKI YOSHIHIKO
description PROBLEM TO BE SOLVED: To reduce the amount of mixture of moisture and particles in a processing container when a lid body for clogging the upper opening of a container body is opened and an object to be processed is brought into or taken out of the processing container. SOLUTION: The processing container 20 includes: the container body 21 internally having a placement base 3 for a substrate S being the object to be processed; and the lid body 22 for clogging the upper opening of the container body 21. A cover member 5 is arranged on the outer peripheral surface of the processing container 20 along the peripheral direction, so as to cover a gap in a region excluding at least the bringing-in/taking-out region of the substrate S when the gap is formed between the lid body 22 and the container body 21 in order to allow the substrate S to be brought into or taken out of the processing container 20. COPYRIGHT: (C)2010,JPO&INPIT
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title VACUUM PROCESSING APPARATUS
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