CHEMICAL SOLUTION SUPPLYING METHOD AND CHEMICAL SOLUTION SUPPLYING DEVICE

PROBLEM TO BE SOLVED: To provide a chemical solution supplying method for supplying solution including persulfate to a chemical mechanical polishing process using slurry and for rapidly measurement-controlling an amount of active ingredient of the persulfate, and to provide its device. SOLUTION: The chemical solution supplying device supplies the persulfate solution having an intended concentration made through dissolution of powder or solid persulfate in solvent to the chemical mechanical polishing process using the slurry. The chemical solution supplying method and its device are structured as that an initial concentration (Cn) of the persulfate solution is calculated through the measurement of an electric conductivity (En) immediately after the dissolution, and after that, the electric conductivity (en) at the time of chemical solution supplying is measured, and the concentration (C) of the persulfate solution at the time of chemical solution supplying is calculated through the calculation of degradation rate-of-change (ΔCn)/(ΔEn) of the persulfate solution at the time of chemical solution supplying to control a degradation in oxidizing power. COPYRIGHT: (C)2010,JPO&INPIT