VAPOR DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates...

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Hauptverfasser: DAIKU HIROYUKI, AZUMA EMIKO
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creator DAIKU HIROYUKI
AZUMA EMIKO
description PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates a vapor deposition material filled in a container main body 4, and, a container 3 for vapor deposition which guides the evaporated vapor deposition material via a material transfer pipe 6 to a surface of a glass substrate K so as to be deposited by evaporation thereon. A jacket 14 for cooling which cools the vapor deposition material 8 within a lower side main body section 4B by cooling water is provided. A heat insulation material 8 is disposed in connection portion between an upper side main body section 4A and a lower side main body section 4B, and a material transfer pipe 6 and heating wire 12 for heating the upper side main body section 4A are provided. The vapor deposition material filled within the container main body 4 is heated by the radiation heat from the inner wall surface of the material transfer pipe 6 heated by the electric heater wire 12 and by the electric heater wire 12 disposed in the upper side main body section 4A, so that the vapor deposition material is evaporated. COPYRIGHT: (C)2010,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2009299115A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2009299115A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2009299115A3</originalsourceid><addsrcrecordid>eNrjZJAKcwzwD1JwcQ3wD_YM8fT3U3AMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBpZGlpaGhqaOxkQpAgCJtyD4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>VAPOR DEPOSITION APPARATUS</title><source>esp@cenet</source><creator>DAIKU HIROYUKI ; AZUMA EMIKO</creator><creatorcontrib>DAIKU HIROYUKI ; AZUMA EMIKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates a vapor deposition material filled in a container main body 4, and, a container 3 for vapor deposition which guides the evaporated vapor deposition material via a material transfer pipe 6 to a surface of a glass substrate K so as to be deposited by evaporation thereon. A jacket 14 for cooling which cools the vapor deposition material 8 within a lower side main body section 4B by cooling water is provided. A heat insulation material 8 is disposed in connection portion between an upper side main body section 4A and a lower side main body section 4B, and a material transfer pipe 6 and heating wire 12 for heating the upper side main body section 4A are provided. The vapor deposition material filled within the container main body 4 is heated by the radiation heat from the inner wall surface of the material transfer pipe 6 heated by the electric heater wire 12 and by the electric heater wire 12 disposed in the upper side main body section 4A, so that the vapor deposition material is evaporated. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20091224&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009299115A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20091224&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009299115A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DAIKU HIROYUKI</creatorcontrib><creatorcontrib>AZUMA EMIKO</creatorcontrib><title>VAPOR DEPOSITION APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates a vapor deposition material filled in a container main body 4, and, a container 3 for vapor deposition which guides the evaporated vapor deposition material via a material transfer pipe 6 to a surface of a glass substrate K so as to be deposited by evaporation thereon. A jacket 14 for cooling which cools the vapor deposition material 8 within a lower side main body section 4B by cooling water is provided. A heat insulation material 8 is disposed in connection portion between an upper side main body section 4A and a lower side main body section 4B, and a material transfer pipe 6 and heating wire 12 for heating the upper side main body section 4A are provided. The vapor deposition material filled within the container main body 4 is heated by the radiation heat from the inner wall surface of the material transfer pipe 6 heated by the electric heater wire 12 and by the electric heater wire 12 disposed in the upper side main body section 4A, so that the vapor deposition material is evaporated. COPYRIGHT: (C)2010,JPO&amp;INPIT</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAKcwzwD1JwcQ3wD_YM8fT3U3AMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBpZGlpaGhqaOxkQpAgCJtyD4</recordid><startdate>20091224</startdate><enddate>20091224</enddate><creator>DAIKU HIROYUKI</creator><creator>AZUMA EMIKO</creator><scope>EVB</scope></search><sort><creationdate>20091224</creationdate><title>VAPOR DEPOSITION APPARATUS</title><author>DAIKU HIROYUKI ; AZUMA EMIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2009299115A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>DAIKU HIROYUKI</creatorcontrib><creatorcontrib>AZUMA EMIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DAIKU HIROYUKI</au><au>AZUMA EMIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VAPOR DEPOSITION APPARATUS</title><date>2009-12-24</date><risdate>2009</risdate><abstract>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates a vapor deposition material filled in a container main body 4, and, a container 3 for vapor deposition which guides the evaporated vapor deposition material via a material transfer pipe 6 to a surface of a glass substrate K so as to be deposited by evaporation thereon. A jacket 14 for cooling which cools the vapor deposition material 8 within a lower side main body section 4B by cooling water is provided. A heat insulation material 8 is disposed in connection portion between an upper side main body section 4A and a lower side main body section 4B, and a material transfer pipe 6 and heating wire 12 for heating the upper side main body section 4A are provided. The vapor deposition material filled within the container main body 4 is heated by the radiation heat from the inner wall surface of the material transfer pipe 6 heated by the electric heater wire 12 and by the electric heater wire 12 disposed in the upper side main body section 4A, so that the vapor deposition material is evaporated. COPYRIGHT: (C)2010,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title VAPOR DEPOSITION APPARATUS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T10%3A00%3A45IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=DAIKU%20HIROYUKI&rft.date=2009-12-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2009299115A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true