VAPOR DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates...

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Bibliographische Detailangaben
Hauptverfasser: DAIKU HIROYUKI, AZUMA EMIKO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus with which long-time operation can be performed by preventing the characteristic deterioration by the heating of a vapor deposition material. SOLUTION: The vapor deposition apparatus includes a container 5 for evaporation which evaporates a vapor deposition material filled in a container main body 4, and, a container 3 for vapor deposition which guides the evaporated vapor deposition material via a material transfer pipe 6 to a surface of a glass substrate K so as to be deposited by evaporation thereon. A jacket 14 for cooling which cools the vapor deposition material 8 within a lower side main body section 4B by cooling water is provided. A heat insulation material 8 is disposed in connection portion between an upper side main body section 4A and a lower side main body section 4B, and a material transfer pipe 6 and heating wire 12 for heating the upper side main body section 4A are provided. The vapor deposition material filled within the container main body 4 is heated by the radiation heat from the inner wall surface of the material transfer pipe 6 heated by the electric heater wire 12 and by the electric heater wire 12 disposed in the upper side main body section 4A, so that the vapor deposition material is evaporated. COPYRIGHT: (C)2010,JPO&INPIT