METAL-CLAD POLYIMIDE SUBSTRATE AND ITS PRODUCTION METHOD
PROBLEM TO BE SOLVED: To provide a metal-clad polyimide substrate which is very low in pinhole numbers occurring on the exterior surface of a copper layer to be formed and is high in folding durability when used in a bent portion, due to excellent pinhole characteristics and MIT folding durability o...
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creator | OGASAWARA SHUICHI SONE HIROBUMI |
description | PROBLEM TO BE SOLVED: To provide a metal-clad polyimide substrate which is very low in pinhole numbers occurring on the exterior surface of a copper layer to be formed and is high in folding durability when used in a bent portion, due to excellent pinhole characteristics and MIT folding durability of the exterior surface. SOLUTION: The metal-clad polyimide substrate is characterized in that: it has a folding durability of 250-3,000 folds as set up in MIT folding durability test and excellent pinhole characteristics of the exterior surface, and that it has a laminated structure comprising a polyimide film of 3-13 μm thickness, a seed layer consisting of at least one metal selected from nickel, chrome or copper formed on the polyimide film and the copper layer formed further on the seed layer. COPYRIGHT: (C)2010,JPO&INPIT |
format | Patent |
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SOLUTION: The metal-clad polyimide substrate is characterized in that: it has a folding durability of 250-3,000 folds as set up in MIT folding durability test and excellent pinhole characteristics of the exterior surface, and that it has a laminated structure comprising a polyimide film of 3-13 μm thickness, a seed layer consisting of at least one metal selected from nickel, chrome or copper formed on the polyimide film and the copper layer formed further on the seed layer. 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SOLUTION: The metal-clad polyimide substrate is characterized in that: it has a folding durability of 250-3,000 folds as set up in MIT folding durability test and excellent pinhole characteristics of the exterior surface, and that it has a laminated structure comprising a polyimide film of 3-13 μm thickness, a seed layer consisting of at least one metal selected from nickel, chrome or copper formed on the polyimide film and the copper layer formed further on the seed layer. 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SOLUTION: The metal-clad polyimide substrate is characterized in that: it has a folding durability of 250-3,000 folds as set up in MIT folding durability test and excellent pinhole characteristics of the exterior surface, and that it has a laminated structure comprising a polyimide film of 3-13 μm thickness, a seed layer consisting of at least one metal selected from nickel, chrome or copper formed on the polyimide film and the copper layer formed further on the seed layer. COPYRIGHT: (C)2010,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS PERFORMING OPERATIONS PRINTED CIRCUITS TRANSPORTING |
title | METAL-CLAD POLYIMIDE SUBSTRATE AND ITS PRODUCTION METHOD |
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