CLEAN ROOM

PROBLEM TO BE SOLVED: To provide a clean room for inexpensively eliminating bad influence by chemical contaminant without disturbing material flow. SOLUTION: A first manufacturing space 3 in which a manufacturing device 5 generating chemical contaminant, and a second manufacturing space 4 free from...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSUCHIYA NAOYA, TANIGUCHI KAZUTO, ISHIGURO TAKESHI, RO TOSHITAMI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a clean room for inexpensively eliminating bad influence by chemical contaminant without disturbing material flow. SOLUTION: A first manufacturing space 3 in which a manufacturing device 5 generating chemical contaminant, and a second manufacturing space 4 free from the manufacturing device 5 are defined, and partitioning walls 10, 11 are respectively disposed between ceiling spaces 3a, 4a, and underfloor spaces 3b, 4b. This clean room includes a FFU (fan filter unit) 30 forming the airflow circulated to the ceiling space 3a, the first manufacturing space 3 and the underfloor space 3b, a FFU 31 forming the airflow circulated to the ceiling space 4a, the second manufacturing space 4 and the underfloor space 4b, an outdoor unit 32 for forming the airflow from the second manufacturing space 4 to the first manufacturing space 3 through a boundary 7, an exhaust fan 33a, and a chemical contaminant eliminating circulation air conditioner 34 for eliminating the chemical contaminant from the air in the first manufacturing space 3 and refluxing the same to the first manufacturing space 3. COPYRIGHT: (C)2010,JPO&INPIT