FEEDING/RECOVERING MEANS FOR VAPOR DEPOSITION MATERIAL, AND VACUUM DEVICE

PROBLEM TO BE SOLVED: To stabilize the operations for feeding and recovering a vapor deposition material in a vacuum deposition device. SOLUTION: The vacuum device includes: a vacuum tank; an evaporation source for heating and evaporating the vapor deposition material; vessels for storing the vapor...

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Bibliographische Detailangaben
Hauptverfasser:	FUJIOKA SHINJI, KIMURA NOBUO, OKAMOTO CHIHIRO, ISHIGAMI TATSUSHI, OTANI SHIGERU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To stabilize the operations for feeding and recovering a vapor deposition material in a vacuum deposition device. SOLUTION: The vacuum device includes: a vacuum tank; an evaporation source for heating and evaporating the vapor deposition material; vessels for storing the vapor deposition material; a container for loading and housing a plurality of vessels; and a transfer means for moving the vessels between the container and the evaporation source. The container is composed of a framework comprising at least a rod. COPYRIGHT: (C)2010,JPO&INPIT