METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING DISPLAY PANEL

PROBLEM TO BE SOLVED: To provide a method of forming a pattern by which a short circuit defective portion can be corrected without breaking an appropriate pattern as well as a desired high-definition pattern can be easily formed without inducing increase in cost or decrease in productivity. SOLUTION...

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1. Verfasser: IZUMI JIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method of forming a pattern by which a short circuit defective portion can be corrected without breaking an appropriate pattern as well as a desired high-definition pattern can be easily formed without inducing increase in cost or decrease in productivity. SOLUTION: In a second exposure step subsequent to first exposure and developing steps, the luminous intensity of irradiation light R2 is decreased to such a degree that, in an area of a second photoresist film 3' irradiated with the irradiation light R2, a saturation exposure region díexposed enough to be dissolved and removed in the subsequent second developing step has a tapered trapezoid cross section as shown in the figure. Thereby, in the stage when the second developing step is finished, a second exposure area not covered with the second photoresist film 3' is formed, as shown in (c), within the first exposure area that is not covered with the first photoresist film 3 but exposed in the stage when the first developing step is finished, because the saturation sensitization region d' is formed in a tapered figure. COPYRIGHT: (C)2010,JPO&INPIT