METHOD FOR PRINTING PATTERN ON SUBSTRATE

PROBLEM TO BE SOLVED: To provide a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. SOLUTION: The method includes steps of forming an in-situ mask for the photosensitive element; exposing the element t...

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Bibliographische Detailangaben
1. Verfasser:	RUDOLPH MICHAEL LEE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLOUR PRINTING ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. SOLUTION: The method includes steps of forming an in-situ mask for the photosensitive element; exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm; and treating the exposed element to form the relief printing form having a pattern of printing areas. Printing is accomplished by securing the relief printing form to a print press, applying the ink to the printing areas on the printing form, and contacting the ink from the printing areas to the substrate to transfer the pattern of ink onto the substrate. COPYRIGHT: (C)2010,JPO&INPIT