CLEANING DEVICE OF IMPLEMENT FOR FILM DEPOSITION

PROBLEM TO BE SOLVED: To clean an implement for film deposition without causing flaws such as scratch marks on the implement for film deposition, deteriorating the removal efficiency, and necessitating a large scale device. SOLUTION: A cleaning device for cleaning the implement 1 for film deposition is equipped with: a cleaning pedestal 3 for mounting the implement for film deposition thereon; a nozzle body 5 which is provided opposite to a surface 1a to be cleaned so as to spray an electrolyte solution 7 onto the surface 1a to be cleaned of the implement for film deposition mounted on the cleaning pedestal 3; an electric source 8 for applying a voltage between the nozzle body 5 and the cleaning pedestal 3 so that the nozzle body 5 functions as one electrode and the cleaning pedestal 3 as the other electrode; an electrolyte solution supply means 6 for supplying the electrolyte solution 7 to the nozzle body 5; and a circulation passage 10 for recovering a waste solution after cleaning the surface 1a to be cleaned and supplying the waste solution to the electrolyte solution supply means 6 as the electrolyte solution 7. The cleaning device can clean and remove metal substances sticking to the implement for film deposition by a simple unit regardless of the shape of the implement for film deposition without causing flaws such as scratch marks on the implement for film deposition. COPYRIGHT: (C)2010,JPO&INPIT