VAPOR DEPOSITION METHOD OF METALLIC OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL

PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly a method for forming a protection film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics by increasing a film-forming rate of an MgO film which functions as the protective film and orients the direction. SOLUTION: The method for forming the metal oxide film by vapor-depositing the metal oxide that is the evaporation material includes: employing an electron gun as a means for heating the evaporation material; narrowing the electron beam emitted from the electron gun; and controlling the rocking waveform of the electron beam based on the diameter of the electron beam and according to the surface area irradiated with the electron beam of the evaporation material. The method increases the film-forming rate of the MgO film which is the protective film for the plasma display that comprises a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film and a back substrate comprising an address electrode, a barrier rib, and a fluorescent substance; and also provides the adequate panel characteristics. COPYRIGHT: (C)2010,JPO&INPIT