POLISHING APPARATUS

PROBLEM TO BE SOLVED: To provide a polishing apparatus which can be installed in a clean room capable of efficiently preventing contaminations. SOLUTION: The polishing apparatus is provided with a polishing block 6 for polishing a target to be polished, a cleaning block 9 for cleaning and drying the...

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Bibliographische Detailangaben
Hauptverfasser: KODAMA SHOICHI, HIUGA KAZUAKI, IMOTO YUKIO, NISHI TOYOMI, WATASE MASAKO, SHIGETA ATSUSHI, YAJIMA HIROMI, TOGAWA TETSUJI, AOKI RIICHIRO, MISHIMA SHIRO, KONO YOSHISUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a polishing apparatus which can be installed in a clean room capable of efficiently preventing contaminations. SOLUTION: The polishing apparatus is provided with a polishing block 6 for polishing a target to be polished, a cleaning block 9 for cleaning and drying the target after polishing, a transporter 8 for transporting the polished target from the polishing block 6 to the cleaning block 9, a first chamber 27 wherein the polishing block 6 is disposed, and a second chamber 26 wherein the transporter 8 and the cleaning block 9 are disposed. The polishing block 6 has a cleaner which includes a turnable 23 and a top ring 22 for supporting the target on the turnable 23 and roughly cleans the polished target on the top ring 22. After being roughly cleaned, the target is removed from the top ring 22 and then is transported to the cleaning block 9 by the transporter 8 and is cleaned and dried in the cleaning block 9. COPYRIGHT: (C)2010,JPO&INPIT