METHOD FOR FORMING RESIST PATTERN, PRODUCTION PROCESS OF MOLD STRUCTURE, AND PRODUCTION PROCESS OF MAGNETIC RECORDING MEDIUM

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern, etc. which curbs circumventing fine powders coming from an end section to a surface of a substrate to be processed. SOLUTION: The method for forming the resist pattern comprises following steps: a cleaning step of clearing the f...

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Hauptverfasser:	NISHIDA YOICHI, USUKI KAZUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER PERFORMING OPERATIONS PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern, etc. which curbs circumventing fine powders coming from an end section to a surface of a substrate to be processed. SOLUTION: The method for forming the resist pattern comprises following steps: a cleaning step of clearing the fine powders at least in an end section 11 of a substrate 10 to be processed; an imprint resist layer forming step of forming the imprint resist layer on the surface of substrate to be processed whose end section is cleared of fine powders; and a resist pattern forming step of pressing a concavo-convex section of a concavo-convex mold comprising a plurality of projections and recessions formed between projections so that the resist pattern of reversed concavo-convex pattern is formed on the surface of substrate to be processed. COPYRIGHT: (C)2010,JPO&INPIT