NANO-IMPRINT COMPOSITION AND NANO-IMPRINT METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide a nano-imprint composition having excellent curability, adhesiveness and releasability in the atmosphere, and a nano-imprint method using the same. SOLUTION: The nano-imprint composition comprises a composition represented by general formula (I), wherein X1represents...

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Hauptverfasser:	YAMAZAKI SUMIAKI, HANAKI NAOYUKI, SHIMADA YASUHIRO, NAKAI YOSHIHIRO, UCHIDA OSAMU, AMAMIYA TAKUMA, NAKATA HIYOKU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a nano-imprint composition having excellent curability, adhesiveness and releasability in the atmosphere, and a nano-imprint method using the same. SOLUTION: The nano-imprint composition comprises a composition represented by general formula (I), wherein X1represents a substituent or halogen atom connected by a hetero atom, X2represents a hydrocarbon group substituted by fluorine atom, Ra and Rb each independently represent hydrogen atom, halogen atom, cyano group or organic residue, and Ra and Rb, or X1and Ra or Rb may be mutually bonded to form an annular structure. COPYRIGHT: (C)2010,JPO&INPIT