FUNCTIONAL ELEMENT, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION USED IN THE SAME, AND METHOD FOR MANUFACTURING FUNCTIONAL ELEMENT

PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition hardly generating a scum, having excellent pattern resolution, and excellent in adhesiveness to an opposed substrate, in a functional element bonded with the two opposedly-arranged substrates via a structure obtained from t...

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Bibliographische Detailangaben
Hauptverfasser: KAWADA YOSHIHIRO, MIYAGAWA NAOFUSA, UMEYAMA TOMOE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition hardly generating a scum, having excellent pattern resolution, and excellent in adhesiveness to an opposed substrate, in a functional element bonded with the two opposedly-arranged substrates via a structure obtained from the negative photosensitive resin composition. SOLUTION: A resin composition for forming the structure is the negative photosensitive resin composition containing (A) an acrylic monomer, (B) an alkali-soluble phenol resin obtained by copolymerizing a hydroxy styrene and a styrene as essential components, (C) a photopolymerization initiator, and (D) an epoxy compound, in the functional element bonded with the two substrates, obtained by press-bonding the second substrate onto the first substrate via the patternized structure provided by photolithography. COPYRIGHT: (C)2009,JPO&INPIT