METHOD FOR MANUFACTURING ANTIREFLECTION FILM, ANTIREFLECTION FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
PROBLEM TO BE SOLVED: To provide an antireflection film which is excellent in chemical resistance, adhesiveness and scuff resistance after moisture and heat treatment such as in a high temperature and high humidity environment, and is inexpensive since properties of a thin film can be improved by fo...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To provide an antireflection film which is excellent in chemical resistance, adhesiveness and scuff resistance after moisture and heat treatment such as in a high temperature and high humidity environment, and is inexpensive since properties of a thin film can be improved by forming an antireflection layer made of one low-refractive index layer. SOLUTION: The method for manufacturing antireflection film includes: a process of providing a hard coat layer directly or via other layer on a film base; and further laminating a low-refractive index layer on the hard coat layer, wherein the hard coat layer contains at least one kind of compound having an HLB value of 3 to 18 and, further, the surface of the hard coat layer is surface-treated and, thereafter, the low-refractive index layer containing at least one kind of hollow silica based particles each of which has an outer shell layer and a porous and hollow interior is laminated on the surface of the hard coat layer. COPYRIGHT: (C)2009,JPO&INPIT |
---|