METHOD FOR MANUFACTURING ANTIREFLECTION FILM, ANTIREFLECTION FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide an antireflection film which is excellent in chemical resistance, adhesiveness and scuff resistance after moisture and heat treatment such as in a high temperature and high humidity environment, and is inexpensive since properties of a thin film can be improved by fo...

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1. Verfasser: OKANO MASARU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an antireflection film which is excellent in chemical resistance, adhesiveness and scuff resistance after moisture and heat treatment such as in a high temperature and high humidity environment, and is inexpensive since properties of a thin film can be improved by forming an antireflection layer made of one low-refractive index layer. SOLUTION: The method for manufacturing antireflection film includes: a process of providing a hard coat layer directly or via other layer on a film base; and further laminating a low-refractive index layer on the hard coat layer, wherein the hard coat layer contains at least one kind of compound having an HLB value of 3 to 18 and, further, the surface of the hard coat layer is surface-treated and, thereafter, the low-refractive index layer containing at least one kind of hollow silica based particles each of which has an outer shell layer and a porous and hollow interior is laminated on the surface of the hard coat layer. COPYRIGHT: (C)2009,JPO&INPIT