EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

PROBLEM TO BE SOLVED: To increase an output of EUV light supplied from an EUV light source device to an exposure machine. SOLUTION: The EUV light source device is provided with: a first vacuum chamber producing EUV light; a first vacuum pump exhausting the first vacuum chamber; a driver laser irradiating laser light on a target substance to produce plasma; an EUV condensing mirror reflecting the EUV light emitted from the plasma and condensing it at a first condensing point; a first pinhole aperture having a pinhole positioned at the first condensing point; a second vacuum chamber communicated with the first vacuum chamber via the first pinhole aperture; a grating diffracting the EUV light passing the first pinhole aperture and condensing it at a second condensing point; a second pinhole aperture having a pinhole positioned at the second condensing point and communicating the second vacuum chamber with an outside; and a second vacuum pump exhausting the second vacuum chamber. COPYRIGHT: (C)2009,JPO&INPIT