LITHOGRAPHIC TEMPLATE

PROBLEM TO BE SOLVED: To provide a method of forming a lithographic template. SOLUTION: A pattern in a semiconductor device 44 deforms by positioning a template 42 extremely adjacent to the semiconductor device 44 which has an optical irradiation reaction material 50 on it, and applying pressure 52...

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Bibliographische Detailangaben
Hauptverfasser:	NORDQUIST KEVIN J, RESNICK DOUG J
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of forming a lithographic template. SOLUTION: A pattern in a semiconductor device 44 deforms by positioning a template 42 extremely adjacent to the semiconductor device 44 which has an optical irradiation reaction material 50 on it, and applying pressure 52 to make the optical irradiation reaction material 50 flow into a relief image 48 existing on the template 42. Next, optical irradiation 53 is performed through the template 42, a part of the optical irradiation reaction material 50 is further cured, and the optical irradiation reaction material 50 is further made to demarcate the pattern. Next, the template 42 is removed and manufacturing of the semiconductor device 44 is completed. COPYRIGHT: (C)2009,JPO&INPIT