WORK CHUCK, WORK HOLDING METHOD AND EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide a work chuck, a work holding method and an exposure apparatus for preventing color irregularity or the like in an exposure pattern of a color filter and achieving exposure with high accuracy and high throughput even when the size of a work for multi-face exposure of...

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Bibliographische Detailangaben
Hauptverfasser:	MATSUZAKA MASAAKI, YUGUCHI SATORU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a work chuck, a work holding method and an exposure apparatus for preventing color irregularity or the like in an exposure pattern of a color filter and achieving exposure with high accuracy and high throughput even when the size of a work for multi-face exposure of the color filter is increased. SOLUTION: As an interval L between a partition wall 811 and a projection 812 is equal to the interval L between projections 812, a bending amount of a lower face WV of a work W held by the chuck is substantially equal in between the partition wall 811 and the projection 812 and between adjacent projections 812. Thus, intervals between the partition wall 811 and the projection 812 and between projections 812 can be adjusted to be substantially equal, which improves the flatness degree of the work W and suppresses exposure irregularity. COPYRIGHT: (C)2009,JPO&INPIT