METHOD FOR MANUFACTURING ANTIREFLECTION FILM, ANTIREFLECTION FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film excellent in chemical resistance, adhesiveness and scratch resistance after moisture-heat treatment under conditions of high temperature and high humidity. SOLUTION: In the method for manufacturing an antireflection f...

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Bibliographische Detailangaben
1. Verfasser:	OKANO MASARU
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film excellent in chemical resistance, adhesiveness and scratch resistance after moisture-heat treatment under conditions of high temperature and high humidity. SOLUTION: In the method for manufacturing an antireflection film by stacking a hard coat layer directly or over other layers on a film base material and further stacking a low refractive index layer on the hard coat layer, the hard coat layer contains at least one fluorine-siloxane grafted polymer, and after the hard coat layer is subjected to surface treatment, a low refractive index layer is stacked thereon, which contains at least one hollow silica-based particles having an outer shell layer and a porous or hollow inner part. COPYRIGHT: (C)2009,JPO&INPIT