POLISHING DEVICE
PROBLEM TO BE SOLVED: To provide a polishing device which carries out polishing of a polishing target surface uniformly and in a short period of time. SOLUTION: The polishing device is formed of: a holding section 3 for holding a polishing object 1 such that the polishing target surface 2 faces upwa...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a polishing device which carries out polishing of a polishing target surface uniformly and in a short period of time. SOLUTION: The polishing device is formed of: a holding section 3 for holding a polishing object 1 such that the polishing target surface 2 faces upward; polishing materials 4 arranged so as to be opposed to the polishing target surface 2 of the polishing object 1 held by the holding section 3; a polishing plate 5 for pressing the polishing materials 4 toward the polishing object 1; an approaching/separating mechanism for approaching/separating the polishing plate 5 to/from the holding section 3; and a complex motion mechanism 9 for moving the polishing object 1 such that the polishing target surface 2 carries out a complex motion of a reciprocative linear motion and an eccentric motion with respect to the polishing materials 4. Herein the plurality of polishing materials 4 are arranged in parallel with each other, and the number of the polishing materials 4 and intervals between the same are set such that almost the whole surface of the polishing target surface 2 is simultaneously polished. The polishing device is further formed of a polishing liquid feeding section for feeding a polishing liquid 7 to the polishing target surface 2 via gaps between the polishing materials 4. COPYRIGHT: (C)2009,JPO&INPIT |
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