LITHOGRAPHIC APPARATUS WITH MULTIPLE ALIGNMENT ARRANGEMENTS AND ALIGNMENT MEASURING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus having multiple alignment arrangements, and to provide an alignment measuring method. SOLUTION: A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s)...

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Bibliographische Detailangaben
1. Verfasser:	VAN BILSEN FRANCISCUS B M
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus having multiple alignment arrangements, and to provide an alignment measuring method. SOLUTION: A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; and calculating another first position of the at least first mark based on the second alignment signal. COPYRIGHT: (C)2009,JPO&INPIT